RF Plasma Atomic Beam Etching

Product Description

RF Plasma Assisted Fast Atom Beam Etching

Mild steel made RF Plasma Atomic Beam Etching equipment is used as an integral part of plasma treatment technique used during manufacturing of semi conductor systems. As part of this technique, highly reactive and energetic materials produced from  different process gases like oxygen tend to react with the sample surface. As its consequence, surface materials break down to small molecules that are finally removed by applying vacuum force. RF Plasma Atomic Beam Etching equipment offered by us has digital display arrangement. It required 240 v voltage and 50 watt power to function. Long working life is one of the key aspects of this etching system.