Microwave Plasma Enhanced Chemical Vapor Deposition

Linear Antenna Based Large Area Microwave Plasma Enhanced Chemical Vapor

•  Linear Antenna Based Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) is suitable to nano -diamond,
• polycrystalline diamond on 300 mmx300 mm substrate. The present system is also to grow diamond like nano-composite
• (DLN) film on silicon solar cells which works as an antireflection coating
• The system consists of the following sub-system
• Edwards Turbo molecular pump model nEXT400D;
• Edwards XDS35i Scroll Vacuum Pump .
• Edwards Roots pump Model EH500 root;
• RF POWER SUPPLY WITH AUTRO MATCHING NETWORK
• GAS MANIFOLD MFC(4) and bellow shield valve(4)
• Monometer capacitance gauge with readout ( Baratron )
• Microwave Plasma Array including Plasma applicator , Power supply etc. from Muegge GMBH
• PLC HMI based electrical control panel