Fast Atom Beam Source

Product Description

Fast atom beam source is used as reliable operating platform where a beam of high energy atom is used to produce ions by striking a specific surface. This beam source emits current that has around ten times more density that the current emitted from any commonly used beam source Known for its strong beam neutralization co-efficiency level, this Fast atom beam source is suitable for etching silicon dioxide, silicon and various other compound materials. Offered beam source is appreciated for its high precision operation and application of pioneering technology.